Heating apparatus having ellipsoidal reflecting mirror
AssigneeNichiden Machinery, Limited
InventorKanji Nagashima
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AssigneeNichiden Machinery, Limited
InventorKanji Nagashima
Estimating the term…
A heating apparatus especially suitable for use in a crystal growth system, comprises a combination of a high pressure xenon arc discharge lamp and an ellipsoidal reflecting mirror having first and second focal points to heat a material feed rod by concentrated infrared radiation from the xenon lamp. The reflecting mirror is divided into at least two mirror portions between which a substantially straight additional part of a predetermined length is interpositioned. The additional part makes the distance between the two foci longer by said predetermined length. The center positions of the xenon lamp and the feed rod are located respectively at points apart from each of the focal points toward each other at a distance corresponding to the predetermined length, so as to obtain a desirable temperature distribution around the rod relative to a major horizontal axial plane of the ellipsoidal reflecting mirror. In addition, a quarter mirror portion behind the xenon lamp is shifted up or downwardly to defocus the image of the radiant heat for achieving a desirable temperature distribution in a vertical plane.
A heating apparatus comprising divided ellipsoidal reflecting mirror means having a first mirror member with a first focal point and a second mirror member with a second focal point, said first and second focal points being located on a common axis (X), a single heat source disposed in the vicinity of said first focal point within said reflecting mirror means, means for holding a substance to be heated by the radiation generated by said heat source so that said substance is disposed in the vicinity of said second focal point within said reflecting mirror means, a substantially straight additional spacer member (16 or 49) having a given length in the direction of the common axis (X), said additional spacer member being interposed between said first and second mirror members to correspondingly increase the spacing between the first and second focal points, said heat source having a center located in a first position spaced from said first focal point and wherein said substance to be heated has a molten zone with a center (28) located at a second position spaced apart from said second focal point to obtain a desired substantially uniform temperature distribution all around said substance to be heated.
Dependencies are inferred from the claim text.