Thermal development of imaged light-sensitive recording material using microwaves
AssigneeFuji Photo Film Co., Ltd.
InventorsYoshihiko Okamoto, Takahiro Ohta
Life of this patent
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Abstract
A process for thermal development, which comprises irradiating with microwaves an imagewise exposed thermally developable recording material in thermal contact with a conductive layer or material having a surface electric resistance ranging from about 1 ohm/.quadrature. to about 10.sup.5 ohm/.quadrature., whereby the heat generated in the conductive layer or material develops the thermally developable recording material.
Claims5
A process for thermal development which comprises irradiating with microwaves an imagewise light exposed thermally developable light-sensitive recording material comprising a support having a conductive material dispersed therein and a thermally developable light-sensitive recording layer on the support and in thermal contact therewith, said support having a surface electric resistence ranging from about 1 ohm/.quadrature. to about 10.sup.5 ohm/.quadrature., whereby the heat generated in said support develops said thermally developable recording material.
Dependencies are inferred from the claim text.