Method for controlling chemical vapor deposition
AssigneeHitachi, Ltd.
InventorsKyo Suda, Katsumi Takami, Akira Shintani, Shinobu Hase
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Abstract
In forming a film of a purposive substance on a substrate by a chemical vapor deposition (CVD), the size of the film-forming substance particles formed in a reactor is detected as an electrical signal and flow rates of respective gases introduced into the reactor are controlled in response to this electrical signal. According to this control method, the fogging phenomenon owing to formation of the film-forming substance in the gas flow can be effectively prevented.
Claims25
In a process for chemical vapor deposition of particles of a film-forming substance on a substrate wherein the particles result from a reaction of gases of a gaseous mixture in a reactor, the improvement comprising measuring optically the particle size of particles of the film-forming substance formed in the reactor, converting the optically measured value to an electric signal, and controlling the flow rate of at least one gas of the gaseous mixture to be introduced into the reactor in response to the electric signal whereby a good quality film is produced.
In a process for chemical vapor deposition of particles of a film-forming substance on a heated substrate wherein the particles result from a reaction of a reacting gas and a component of a mixed gas in a reactor, the improvement comprising measuring optically the size of particles of the film-forming substance formed in the reactor, converting the optically measured value to an electric signal, detecting the particle size as the electric signal and controlling the flow rate of at least one of the reacting gas and mixed gas in response to the electric signal.
In a process for forming a film of a substance on a substrate from a reacting gas of one of oxygen and ammonia and a multicomponent mixed gas containing nitrogen and silane by a chemical vapor deposition, the improved method for controlling the chemical vapor deposition which comprises measuring optically the size of particles of the film-forming substance formed in a reactor, converting the optically measured value to an electric signal, detecting the particle size as the electric signal and controlling the flow rate of at least one of the reacting gas and a component of the mixed gas in response to said electric signal.
Dependencies are inferred from the claim text.