Method for preparing substrate surfaces for electroless deposition
AssigneeInternational Business Machines Corporation
InventorsWarren Alan Alpaugh, George Joseph Macur, Gary Paul Vlasak
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AssigneeInternational Business Machines Corporation
InventorsWarren Alan Alpaugh, George Joseph Macur, Gary Paul Vlasak
Estimating the term…
A three step seeding process with a hot water rinse and bake includes first contacting the surface of a substrate with a stannous chloride sensitizing solution, followed by a hot water rinse to remove any excess stannous chloride. Next, a palladium chloride activator is used to interact with the stannous compounds to form an adherent layer of metallic palladium particles. Thereafter, the surface is subjected to a palladium chloride/stannous chloride/HCL seeder bath which deposits a final catalytic layer on the surface and drilled through holes to facilitate the electroless plating of a metal of the substrate. A subsequent baking at a temperature between 105.degree. C and 120.degree. C sets the seeder on the substrate surface and in the through holes in the substrate.
A method for conditioning the surfaces of a dielectric base material for the electroless plating of a conductive metal thereon, comprising the steps of:
Dependencies are inferred from the claim text.