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US 4,066,676 AGranted
Photosensitive material comprising polyacetylenic amine salts
AssigneeEastman Kodak Company
InventorsMelvin S. Bloom, Sally S. Fico
Life of this patent
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Abstract
Amine salts of polyacetylenic compounds containing a carboxylate moiety, preferably in conjunction with a group capable of hydrogen bonding, have unusually high radiation sensitivity, and are useful radiation-sensitive components in imaging systems.
Claims4
Radiation-sensitive crystalline polyacetylenic amine salts having the structural formula:
- D - (CH.sub.2).sub.x (C.tbd.C).sub.n (CH.sub.2).sub.y -COO.sup.- A.sup.+
- wherein:
- n is an integer greater than 1;
- x and y are each an integer from 0 to 10;
- A is NRR.sup.1 R.sup.2 R.sup.3 wherein R, R.sup.1, R.sup.2 and R.sup.3 are H, alkyl of from 1 to 15 carbon atoms, aryl or substituted alkyl having substituents chosen from the group consisting of hydroxy, amino, carboxy and methoxy substituents;
- D is selected from the group consisting of
- Ch.sub.3,
- coor.sup.4, and
- Conhr.sup.5, wherein
- R.sup.4 is H or lower alkyl,
- R.sup.5 is substituted alkyl of from 3 to 8 carbon atoms in which the substituent is alkylthio.
8 more elements
Dependencies are inferred from the claim text.