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US 4,063,953 AGranted
Photosensitive composition
AssigneeMitsubishi Chemical Industries Limited
InventorsHideo Fukutani, Konoe Miura, Yoshihiro Takahashi, Kazuo Torige
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Abstract
A photosensitive composition is prepared from a mixture of a photosensitive resin containing radicals having the formula ##STR1## wherein X and Y represent hydrogen, halogen, cyano or nitro, Ar represents an aryl radical or a substituted aryl radical, and n represents 1 or 2, and a solvent having the formula ##STR2## wherein R and R" represent a lower alkyl radical and R' represents a lower alkylene radical.
Claims3
A photosensitive composition which consists essentially of:
- a photosensitive amount of a photosensitive resin containing units of the formulas:
- ##STR8## wherein Ar is phenyl in an amount of 4-methoxy-4-methylpentanone -2, 4-ethoxy-butanone-2 or 4-ethoxy-4-methylpentanone-2 sufficient to dissolve said photosensitive resin, to maintain an acceptable sensitivity of said composition, to stabilize said resin upon storage and to permit a uniform thin membrane to form when said composition is coated.
Dependencies are inferred from the claim text.