Method of forming an embossed pattern

A method of forming an embossing pattern which is comprised of providing on one of a pair of working surfaces, a soluble light sensitive coating which turns insoluble under exposure, while on the other, providing an insoluble light sensitive coating which turns soluble under exposure placing on one of the working surfaces, a transparent mask on which a predetermined pattern coordinated to an etching pattern is transparently or opaquely expressed and is closely fitted onto the light sensitive coating, while on the other working surface, another transparent mask of the same type on which the aforementioned pattern is symmetrically expressed is similarly closely fitted;

• then, exposing each working surface such that on one working surface, the pattern coordinated to that to be embossed is drawn positive with an acid-resistant coating, while on the other working surface, another pattern symmetrical and identical in size to the aforementioned pattern is drawn negative, thereafter, both working surfaces are subjected respectively to an etching treatment, thereby forming a concavity and a convexity corresponding to the patterns of the acid-resistant coatings, while etching treatment is applied such that a predetermined etching is produced on the sides of the concavity and the convexity, so that an appropriate clearance may be formed between the side surfaces of the said coordinated concavity and convexity.