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US 4,059,449 AGranted
Photoresist containing a thiodipropionate compound
AssigneeRCA Corporation
InventorsThomas Francis Rosenkranz, Richard Joseph Himics
Life of this patent
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Abstract
This invention relates to a photoresist consisting of a novolak resin and a sensitizer containing a thiodipropionate compound.
Claims13
A photoresist composition comprising:
- a. an alkali-soluble novolak resin
- b. a naphthoquinone-(1,2)-diazide sulfonic acid ester sensitizer;
- and
- c. a thiodipropionate compound of the formula ##STR6## wherein R is an alkyl or alkenyl group having 6 to 24 carbon atoms and wherein the relative proportion of the thiodipropionate compound is from about 0.5 to 15 parts by weight per 100 parts by weight of the novolak resin.
1 more element
Dependencies are inferred from the claim text.