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US 4,054,454 AGranted
Photosensitive copolymer on silicon support
AssigneeRCA Corporation
InventorsRichard Joseph Himics, Scott Oliver Graham, Daniel Louis Ross
Life of this patent
Estimating the term…
Abstract
Copolymers of certain keto-olefins and SO.sub.2 are sensitive to light and form films useful as photoresists in the manufacture of printed circuits, integrated circuits, printing plates and the like.
Claims6
A recording medium comprising a film containing a sufficient amount of a photosensitive copolymer to form a photoresist wherein the photosensitive copolymer is a copolymer of SO.sub.2 and a keto-olefin of the formula:
- ##STR2## wherein R.sub.1 is alkyl, aryl or substituted aryl;
- R.sub.2 is hydrogen or methyl;
- x is an integer of 1 or 2;
- R.sub.3 is hydrogen or is part of a carbocyclic ring with R.sub.4 or R.sub.5, with the proviso that when x is 2, R.sub.3 is hydrogen;
- R.sub.4 is hydrogen, alkyl or aryl, R.sub.5 is hydrogen or when R.sub.4 is hydrogen, is alkyl or aryl, or R.sub.4 and R.sub.5 together are part of a carbocyclic ring, on a support.
2 more elements
Dependencies are inferred from the claim text.