US 4,049,533 A · Device for producing coatings by means of ion sputtering

Abstract

A device intended for producing single-layer coatings or films, for example, artificial diamond coatings or films, as well as multilayer or sandwich coatings. The device comprises a plurality of vacuum discharge chambers and at least two pairs of cathodes arranged in each of the chambers. Each pair of cathodes is provided with an anode which is disposed equidistantly from the cathodes forming each respective pair, the anodes of all the pairs of cathodes being arranged in one plane, whereas the cathodes in all the pairs are arranged in two planes that are parallel to the plane in which the anodes are arranged. Articles to be coated are arranged at the point of convergence of atomic beams of the cathode substance being sputtered. Each chamber is provided with a magnetic field source of its own. There is a vacuum evacuation system for all the chambers.

Claims14

Dependent claims

A device for producing films by means of ion sputtering of substances in an ionized gas atmosphere, comprising:

a vacuum discharge chamber comprising cooling means, a magnetic field source means, a vacuum evacuation system and an inert gas supply means;
at least two pairs of cathodes arranged in the chamber, the geometrical centers of flat sputterable surfaces of the cathodes being equally spaced from each other in each pair of cathodes and being found in parallel plane, each pair of cathodes having an anode equally spaced from the cathodes forming each respective pair, all anodes of all of the pairs of cathodes being located in a plane parallel to the planes in which the cathodes are found at least one holder adapted to hold articles to be coated arranged in the plane in which all of the anodes are located at the point of convergence and overlapping of atomic beams of sputtered material from all of the cathodes;
and a power source of all of the cathodes and anodes of the chamber.

A device for producing films by mans of ion sputtering of substances in an ionized gas atmosphere, comprising:

a vacuum discharge chamber comprising cooling means, a magnetic field source means, a vacuum evacuation system and an inert gas supply means;
two pairs of cathodes arranged in the chamber, the geometrical centers of flat sputterable surfaces of the cathodes being equally spaced from each other in each pair of cathodes and being found in parallel planes, each pair of cathodes having an anode equally spaced from the cathodes forming each respective pair, all anodes of all of the pairs of cathodes being located in a plane parallel to the planes in which the cathodes are found, the geometrical centers of the cathodes being found at four apexes of the lattice base of an imaginary octahedron;
two holders, each of the holders adapted to hold an article located at each of the distal apexes of the octahedron opposite the lattice base;
and a power source of all of the cathodes and anodes of the chamber.

1 more element

Dependencies are inferred from the claim text.

Device for producing coatings by means of ion sputtering

Life of this patent

Device for producing coatings by means of ion sputtering

Life of this patent

Abstract

Claims14