Method of and device for providing thin layers by cathode sputtering
AssigneeU.S. Philips Corporation
InventorsRalf-Dieter Boehnke, Waldemar Gotze
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Abstract
A mould and supporting dish for dry-compressed powder targets which are constructed so that adsorbed residual gases can readily escape during the evacuation process of the cathode sputtering device via substantially all the surfaces of the powder target, so that the powder target is not torn or its structure damaged during the evacuation process. The adsorbed residual gases can escape through apertures in the bottom and side wall of the supporting dish.
Claims4
In a method of providing thin layers on a substrate by cathode sputtering from a compressed powder target in a vacuum, the improvement wherein any gases adsorbed in the compressed powder target are removed therefrom through surface pores including pores in the bottom surface of the target.
A supporting dish for supporting a compressed powder target, the bottom surface and side surfaces of said dish having apertures extending normal to the surfaces, in which the apertures on the surfaces adapted to face the target are formed as funnels which change into neck portions and emerge into parallel extending ducts which are provided on the surfaces of the supporting dish remote from the powder target.
Dependencies are inferred from the claim text.