Scratch-resistant mask for photolithographic processing
AssigneeGeneral Electric Company
InventorCarlyle F. Smith, Jr.
Life of this patent
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Abstract
Disclosed is a photomask and a method for the manufacture thereof. A metal stencil is disposed on a glass substrate such that only preselected areas of the glass which are to be made opaque are exposed. A grit-etch step follows in which depressions are formed in the glass substrate in the preselected areas. Fusible masking material is sprayed in the depressions through the metal stencil. The masking material is preferably in particulate form in a volatile carrier liquid. The carrier liquid is preferably first driven off and, then, the combination is exposed to a relatively high temperature that fuses the masking material to the substrate.
Claims3
A photomask comprising a glass substrate having depressions formed in a major surface thereof and opaque ceramic masking material fused to said substrate in said depressions, wherein only a narrow peripheral portion of each body of said masking material is coplanar with said major surface, the remaining portion of the exposed surface of each of said bodies of masking material being depressed beneath the plane of said major surface.
Dependencies are inferred from the claim text.