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US 4,047,216 AGranted
High speed low capacitance charge coupled device in silicon-sapphire
AssigneeRockwell International Corporation
InventorBarry T. French
Life of this patent
Estimating the term…
Abstract
A charge coupled device (CCD) built in a semiconductor island on sapphire substrate has very low gate capacitances and consequently will operate at very high speeds.
Claims2
In combination:
- an electrically insulating substrate;
- a strip of material capable of supporting charge coupled device action disposed on said substrate and comprising a charge transfer channel of a charge coupled device;
- said strip including a first layer of semiconductor material adjacent said substrate having relatively high conductivity and a second layer of semiconductor material which has a relatively low conductivity;
- insulation means disposed on said strip of material and on said substrate;
- a set of charge coupled device control electrodes disposed on said insulation means for controlling the transfer of charge within said charge transfer channel when appropriate control signals are applied thereto;
- said insulation being thick enough to insulate said control electrodes from said underlying strip of material and thin enough to enable control signals applied to said set of charge coupled device control electrodes to control the transfer of charge within said charge coupled device;
- and
- said second layer of semiconductor material is thin enough that when control potentials are applied to the device, all of potential wells of the charge coupled device will extend substantially entirely through said second layer at all times whereby variations in the depths of the potential wells are accommodated by variations in the depth of the penetration of said potential wells into said first layer of semiconductor material whereby transfer inefficiencies induced by traps in the second layer of said semiconductor material are minimized by avoiding repetitive filling and emptying of those traps.
5 more elements
A charge coupled device system comprising:
- a charge coupled device having a charge transfer channel, said device comprising:
- an electrically insulating substrate;
- a layer of semiconductor material disposed on said substrate, said layer of semiconductor material comprising said charge transfer channel, said layer of semiconductor material comprising a first film adjacent said substrate having a higher conductivity than a second film which comprises the remainder of said layer;
- a layer of insulating material disposed on said layer of semiconductor material;
- a set of charge coupled device control electrodes disposed on said layer of insulating material for controlling transfer of charge within said charge transfer channel when appropriate control signals are applied thereto;
- and
- said layer of insulating material being thick enough to insulate said control electrodes from said underlying semiconductor material and thin enough to enable control signals applied to said set of charge coupled device control electrodes to control the transfer of charge within said charge coupled device;
- control means for generating and applying control signals to said control electrodes wherein the minimum potential applied to the control electrodes during operation of the device is sufficient to cause the potential well in the charge transfer material thereunder to extend at least substantially all the way through said second film and into said first film;
- and
- said first film being sufficiently thick and of sufficiently high conductivity to enable the variations in potential which are necessary to effect the controlled transfer of charge in said charge coupled device to be accomodated by variations in the depth of penetration of potential wells into said first film.
7 more elements
Dependencies are inferred from the claim text.