Controlled vapor chamber cooking device

A controlled vapor chamber cooking device having:

• a housing defining a sealed vapor chamber and having an extended top wall for providing a cooking surface;
• a capillary wick disposed along the bottom surface of said chamber;
• a plurality of internal structural support members disposed between said wick and the upper surface of said chamber and secured to said upper surface, said support members defining a plurality of vapor pressure equalization holes;
• a quantity of volatile working fluid disposed in said chamber sufficient to saturate said wick when in a liquid state;
• means for heating said chamber to vaporize working fluid contained therin;
• means responsive to the vapor pressure within said chamber for controlling said heating means to maintain said vapor pressure within a predetermined range;
• and
• means defining an auxiliary chamber having a volume equal to at least about twice the liquid volume of said working fluid in fluid communication with said vapor chamber, a valve disposed to selectively allow and preclude said fluid communication and pressure actuated means for controlling said valve to preclude said fluid communication under normal operating conditions and to allow said fluid communication upon the occurrence of said overpressure condition.