Method for the preparation of relief structures
AssigneeSiemens Aktiengesellschaft
InventorsWolfgang Kleeberg, Roland Rubner, Wieland Bartel
Life of this patent
Estimating the term…
Loading patent…
AssigneeSiemens Aktiengesellschaft
InventorsWolfgang Kleeberg, Roland Rubner, Wieland Bartel
Estimating the term…
Novel cyclic monomers leaving two functional groups capable of undergoing condensation reactions to form amide, urea or urethane linkages and at least one photo or radiation-reactive group are condensed with cyclic comonomers to form a soluble, substantially-linear condensation pre-polymer. A solution of the prepolymer is applied to a substrate and the solution is evaporated off to form a film or foil. The photo or radiation-sensitive layer or foil is exposed or irradiated through a pattern, the unexposed or unirradiated part is dissolved or stripped off, and the relief structure which remains is annealed if necessary. The relief structures obtained are distinguished particularly by the sharpness of their edges, good mechanical and chemical properties as well as good insulating properties. They are suited particularly for the preparation of miniaturized insulating layers.
In a method for the preparation of relief structures consisting of highly heat resistant polymers comprising the steps of applying a soluble, photo or radiation-sensitive prepolymer of defined structure in the form of a film to a substrate or in the form of a foil, exposing or irradiating the photo or radiation active layer through a negative pattern, dissolving or stripping of the unexposed or unirradiated portions and annealing the relief structure obtained, the improvement which comprises forming said film or foil from a poly-addition or poly-condensation prepolymer having repeating units of the formula:
Dependencies are inferred from the claim text.