Collimated x-ray source for x-ray lithographic system
AssigneeThe United States of America as represented by the Secretary of the Air Force
InventorThomas E. Fenstermacher
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Abstract
In an X-ray lithographic system, high power X-ray illumination of photo-resist coated substrate members is accomplished by projecting a collimated X-ray beam, emitted from an extended area X-ray source, through the patterned apertures of an X-ray absorbent mask. Improved efficiency is achieved by limiting X-ray emission to the discrete portions of the extended area emission surface that corresponds to related patterned mask apertures.
Claims1
In an X-ray lithographic system, apparatus for projecting patterned X-ray illumination onto a photo resist coated substrate member comprising
- an X-ray source having an extended X-ray emission area,
- an X-ray collimater adapted to collimate X-rays emitted from said X-ray source, and
- an X-ray adsorbant mask having patterned X-ray transmitting apertures therein positioned proximate to said substrate member and in intercepting relationship with X-ray illumination transmitted through said collimator said X-ray source being adapted to provide X-ray emission from only discrete portions of said extended X-ray emission area, each said discrete X-ray emitting portion being substantially coextensive in area to and aligned in register with a corresponding patterned X-ray transmitting aperture in said X-ray adsorbant mask.
Dependencies are inferred from the claim text.