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AssigneeRCA Corporation
InventorsMichael Thomas Gale, James Kane
Estimating the term…
A surface relief pattern, e.g. a surface relief hologram, is substantially linearly transferred to a hard durable substrate, capable of being used as a medium for permanent storage of the pattern or as a master for replicating the hologram, from a photoresist coated on the substrate, by exposing the photoresist and the substrate to a photoresist developer bath and a chemical bath capable of etching the substrate at a rate substantially proportional to the development rate of the photoresist. This technique allows the transfer of surface relief patterns with dimensions on the order of one micron or less, and is applicable to the formation of surface relief holographic patterns in permanent media for archival storage and to making master surface relief holograms.
A method for transferring a spatially-distributed, continuously-variable exposure pattern recorded on the surface of a substantially uniform layer of photoresist on a substrate into a corresponding surface relief pattern on the surface of the substrate itself underlying the photoresist, in which the amplitude on the surface relief pattern at any given point on said surface of said substrate is a function of the amount of exposure of said exposure pattern at the point on said surface of said photoresist which corresponds with that given point, said method comprising the following steps:
Dependencies are inferred from the claim text.