Improved Run-to-Run Control in Semiconductor Manufacturing
AssigneeRobert Bosch GmbH
InventorsAndreas Finn, Ulrich Potthoff
Life of this patent
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Abstract
A method is for adjusting a process control for manufacturing a component in production. The method includes obtaining measurement results based on the component, and defining a process step with which the component is to be processed. The method further includes determining a parameterization of the process step by means of a run-to-run (“R2R”) controller for the process step, depending on the measurement results. The measurement results include either (i) virtual measurement results, or (ii) virtual measurement results and physical measurement results.
Claims6
A method for adjusting a process control in order to manufacture at least one component in production, comprising:
- obtaining measurement results based on the at least one component in production;
- determining, based on the measurement results, a parameterization of a specified process step for the at least one component in production or at least one subsequent component in production using a run-to-run (“R2R”) controller;
- wherein the measurement results include either (i) virtual measurement results, or (ii) virtual measurement results and physical measurement results,
- wherein the virtual measurement results are detected with a virtual measuring device,
- wherein the virtual measuring device determines the virtual measurement results through software based on at least one data query, and
- wherein the virtual measuring device is configured to output a plurality of measuring device states in a manner corresponding to an output of a physical measuring device.
Dependencies are inferred from the claim text.