Substrate processing apparatus
AssigneeEbara Corporation
InventorsMasayuki SATAKE, Jumpei FUJIKATA, Masashi SHIMOYAMA
Life of this patent
Estimating the term…
Loading patent…
AssigneeEbara Corporation
InventorsMasayuki SATAKE, Jumpei FUJIKATA, Masashi SHIMOYAMA
Estimating the term…
The present invention relates to a substrate processing apparatus for applying a filler to a gap between edge portions of substrates constituting a laminated substrate. The substrate processing apparatus for applying the filler (F) to the laminated substrate (Ws) having a first substrate (W1) and a second substrate (W2) bonded to each other, includes: a substrate holding device (2) configured to hold and rotate the laminated substrate (Ws); and a multi-nozzle head (20) configured to apply the filler (F) to a gap (G) between an edge portion (E1) of the first substrate (W1) and an edge portion (E2) of the second substrate (W2). The multi-nozzle head (20) includes a plurality of liquid jet nozzles (21) configured to emit the filler (F), and the plurality of liquid jet nozzles (21) are arranged along a rotation axis (Ct) of the substrate holding device (2).
A substrate processing apparatus for applying a filler to a laminated substrate having a first substrate and a second substrate bonded to each other, comprising:
Dependencies are inferred from the claim text.