Semiconductor device and method for manufacturing the same

A method for manufacturing a semiconductor device, the method comprising:

• forming a plurality of active regions repeatedly spaced apart from each other in a first direction and a second direction, the plurality of the active regions extends in a diagonal direction with respect to the first direction, and is surrounded by a cell isolation region;
• forming a first insulation layer over the plurality of the active regions and the cell isolation region;
• forming a plurality of open trenches, each of which is formed by etching a portion of two adjacent active regions and a portion of the first insulation layer;
• forming a pad layer that covers not only a plurality of first pad insulation regions remaining after the first insulation layer is etched, but also the plurality of the open trenches;
• removing a portion formed at a central portion of each of the open trenches among the pad layer;
• and
• forming a second pad insulation region at the central portion of the open trench.

A method for manufacturing a semiconductor device, the method comprising:

• forming a plurality of active regions surrounded by a cell isolation region;
• forming a first insulation layer over the plurality of the active regions and the cell isolation region;
• forming an open trench by etching a portion of two adjacent active regions and a portion of the first insulation layer;
• forming a pad layer in the open trench;
• forming a second pad insulation region at a central portion of the open trench;
• forming a plurality of word-line structures overlapping with the plurality of the active regions;
• forming a plurality of bit-line contact regions extending in a second direction, and is spaced apart from each other in a first direction;
• forming a plurality of bit-line electrode layers respectively disposed on the bit-line contact regions;
• and
• forming a plurality of bit-line spacers, each of which contacts both sides of each of the bit-line electrode layers and extends in the second direction.