Open czochralski furnace for single crystal growth
AssigneeBoya Advanced Materials Co., Ltd.
InventorsYu WANG, Weiming GUAN, Zhenxing LIANG
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Abstract
The present disclosure provides a temperature field device for crystal growth. The temperature field device may include a drum; a filler filled in the drum and configured to support a crucible; a bottom plate mounted on a bottom of the temperature field device and covering a bottom end of the drum; and a cover plate mounted on a top of the temperature filed device and covering a top end of the drum.
Claims20
An apparatus for crystal growth, comprising a furnace chamber, wherein the furnace chamber is a non-closed structure.
A furnace chamber for crystal growth, wherein the furnace chamber is a non-closed structure.
Dependencies are inferred from the claim text.