Process for preparing of transition metal-containing films
AssigneeBASF SE
InventorsAlexander Georg HUFNAGEL, Sinja Verena KLENK, Hagen WILMER, Daniel LOEFFLER
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Abstract
The present invention is in the field of processes for preparing of transition metal-containing films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing a transition metal-containing film on a substrate comprising (a) forming an organic-inorganic hybrid film by repeatedly bringing the substrate in contact with a transition metal-containing compound and an organic acid in the gaseous state, wherein the organic acid is oxalic acid, glyoxylic acid, or glycolic acid, and (b) decomposing the organic-inorganic hybrid film into a transition metal-containing film by thermal treatment.
Claims12
1-11. (canceled)
A process for preparing a transition metal-containing film on a substrate comprising:
- (a) forming an organic-inorganic hybrid film by repeatedly bringing the substrate in contact with a transition metal-containing compound and an organic acid in the gaseous state, wherein the organic acid is oxalic acid, glyoxylic acid, or glycolic acid, and
- (b) decomposing the organic-inorganic hybrid film into a transition metal-containing film by thermal treatment.
Dependencies are inferred from the claim text.