Thin-film deposition apparatus and method
AssigneePicosun Oy
InventorsJuhana KOSTAMO, Tom BLOMBERG, Mikko NÄSI
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Abstract
A thin-film deposition (100) apparatus comprising, a reaction chamber (110) for accommodating a stack of substrates (120) arranged with their planar surfaces facing each other, a fluid distributor (150) for establishing a laminar fluid flow to propagate from a reaction chamber entrance (230) through the length of the reaction chamber (110) and between the substrate surfaces, wherein the fluid distributor (150) comprises an expansion region (210) configured to laterally expand reactant fluid flows (F1, F2) received from gas inlets (155a, 155b), and a cooler (160) coupled to the expansion region (210) and configured to control the temperature of the expansion region (210).
Claims17
A thin-film deposition apparatus comprising:
- a reaction chamber for accommodating a stack of substrates arranged with their planar surfaces facing each other;
- a fluid distributor for establishing a laminar fluid flow, by combining first reactant fluid flow and second reactant fluid flow, to propagate from a reaction chamber entrance through the length of the reaction chamber and between the substrate surfaces, wherein the fluid distributor comprises an expansion region configured to laterally expand the reactant fluid flows before forming the laminar fluid flow;
- and
- a cooler coupled to the expansion region and configured to control the temperature of the expansion region.
A method for thin-film deposition, comprising:
- loading a stack of substrates to a reaction chamber;
- providing first reactant fluid flow and second reactant fluid flow to an expansion region of a fluid distributor upstream of a reaction chamber;
- expanding said reactant fluid flows laterally within the expansion region;
- controlling temperature of the expansion region and the reactant fluid flows within the expansion region by a cooler which is coupled to the expansion region;
- and
- establishing a laminar fluid flow, by combining said reactant fluid flows, by the fluid distributor, to propagate from a reaction chamber entrance through the length of the reaction chamber and between the substrate surfaces for substrate processing.
Dependencies are inferred from the claim text.