Deposition mask, method of fabricating the same, method of manufacturing display device using the same and electronic device including the display device

Abstract

In a method of fabricating a deposition mask, a first photoresist pattern including first holes and a second photoresist pattern including second holes are formed on a first surface and a second surface of a mask body, respectively. The first surface and the second surface oppose each other. The mask body is etched to define first recesses at an upper portion of the mask body through the first holes and define second recesses connected to each of the first recesses at a lower portion of the mask body through the second holes. Each of the second holes has a width smaller than a width of each of the first holes, and each of the second recesses has a width larger than a width of each of the first recesses.

Dependencies are inferred from the claim text.