Substrate processing apparatus

A substrate processing apparatus, comprising:

• a processing liquid supplier which outputs a temperature-regulated processing liquid;
• a substrate processor which processes a substrate using the processing liquid supplied from the processing liquid supplier;
• and
• an interconnecting pipe which connects the processing liquid supplier and the substrate processor to each other and passes the processing liquid therethrough, wherein
• the interconnecting pipe includes:
• a processing liquid pipe through which the processing liquid flows;
• an exterior pipe having a hollow internal space in which the processing liquid pipe is inserted, thereby covering a periphery of the processing liquid pipe;
• and
• a spacer member which is arranged between the processing liquid pipe and the exterior pipe in the internal space and maintains an outer wall surface of the processing liquid pipe and an inner wall surface of the exterior pipe in a non-contact state, and wherein
• the spacer member includes a flow path forming part functioning as a gas flow path allowing gas to pass therethrough in a pipe axis direction of the processing liquid pipe in the internal space.