Strain engineering of membrane layers in heterostructures
AssigneeThe University of Chicago
InventorsAlexander A. High, Xinghan Guo, Zixi Li, Tianle Liu, Nazar Delegan, Joseph Paul Heremans
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AssigneeThe University of Chicago
InventorsAlexander A. High, Xinghan Guo, Zixi Li, Tianle Liu, Nazar Delegan, Joseph Paul Heremans
Estimating the term…
Provided are methods of generating strain in membrane layers, including diamond membrane layers, in heterostructures. In embodiments, a method of forming a strained membrane layer comprises heating a heterostructure, the heterostructure comprising a membrane layer, a substrate, and a bonding layer between the membrane layer and the substrate, under conditions to cure the bonding layer and form a bonded heterostructure, wherein the membrane layer and the substrate have a thermal expansion ratio mismatch; and cooling the bonded heterostructure under conditions to convert the membrane layer in the bonded heterostructure to a strained membrane layer characterized by a strain profde comprising anon-zero strain value, wherein the strained membrane layer comprises a suspended region and a supported region and wherein the suspended region exhibits a strain value greater than a strain value exhibited by the supported region. Bonded heterostructures comprising the strained membrane layers are also provided.
A method of forming a strained membrane layer, the method comprising:
The method of claim 18, further comprising patterning the substrate prior to step (a).
A bonded heterostructure comprising a strained membrane layer characterized by a strain profile comprising a non-zero strain value;
Dependencies are inferred from the claim text.