Device including two dimensional junction between van der waals material and electrode, and manufacturing method thereof

Abstract

Disclosed are a device including a two-dimensional junction between a van der Waals material and an electrode, and a manufacturing method thereof, the device including: a lower insulating layer made of an insulating 2D material; a conductive layer stacked on the lower insulating layer by interlayer van der Waals bonding and made of a conductive 2D material; an upper insulating layer stacked on the conductive layer by interlayer van der Waals bonding, made of an insulating 2D material, and having a selective etching region formed therein; an electrode layer formed in the selective etching region to form a planar contact with the conductive layer; a gate insulating layer formed on the upper insulating layer and the electrode layer; and first and second gate electrodes located on the gate insulating layer, under the lower insulating layer, or both, and applying a gate electric field to at least a partial region of the conductive layer.

Dependencies are inferred from the claim text.