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US 2026/0302067 A1Published application
Dielectric film and method for manufacturing the same, metalized film and method for manufacturing the same, film capacitor and method for manufacturing the same, inverter, and vehicle
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsYOICHI OGOSHI, NOBUYUKI SETO
Life of this patent
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Abstract
A dielectric film includes polypropylene. In a diffraction pattern of X-ray diffraction measurement to the dielectric film, a ratio (IB/IA) of a peak intensity IB to a peak intensity IA is 0.527 or more, the peak intensity IA being derived from a (040) plane of an α crystal of the polypropylene, the peak intensity IB being derived from a (060) plane of an α crystal of the polypropylene.
Claims20
A dielectric film comprising polypropylene, wherein
- in a diffraction pattern of X-ray diffraction measurement to the dielectric film, a ratio (IB/IA) of a peak intensity IB to a peak intensity IA is 0.527 or more, the peak intensity IA being derived from a (040) plane of an α crystal of the polypropylene, the peak intensity IB being derived from a (060) plane of an α crystal of the polypropylene.
A dielectric film comprising polypropylene, wherein
- 2.2≤(PB/PA) is satisfied, an orientation parameter PA in an MD direction (machine direction) of the dielectric film and an orientation parameter PB in a TD direction (transverse direction) of the dielectric film being respectively defined by the following expressions:
- PA
- =
- (
- A
-
- 972
- /
- A
-
- 1376
- )
- PB
- =
- (
- B
-
- 972
- /
- B
-
- 1376
- )
- where
- A972 represents an absorption peak intensity at a wavenumber of 972 cm−1 in a Fourier Transform Infrared Spectroscopy spectrum measured in a state where a light source is polarized in the MD direction,
- A1376 represents an absorption peak intensity at a wavenumber of 1376 cm−1 in the Fourier Transform Infrared Spectroscopy spectrum measured in the state where the light source is polarized in the MD direction,
- B972 represents an absorption peak intensity at a wavenumber of 972 cm−1 in a Fourier Transform Infrared Spectroscopy spectrum measured in a state where the light source is polarized in the TD direction, and
- B1376 represents an absorption peak intensity at a wavenumber of 1376 cm−1 in the Fourier Transform Infrared Spectroscopy spectrum measured in the state where the light source is polarized in the TD direction.
25 more elements
A method for manufacturing a dielectric film, the method comprising:
- a preparation step of preparing a dielectric film including polypropylene;
- and
- a processing step of subjecting the dielectric film to tensile processing at a tensile stress more than or equal to a yield point of the dielectric film, the tensile processing being performed at a temperature of 80° C. or lower.
Dependencies are inferred from the claim text.