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US 2026/0299402 A1Published application
Method and apparatuses for disposing of excess material of a photolithographic mask
AssigneeCarl Zeiss SMT GmbH
InventorsMichael Budach, Christof Baur, Klaus Edinger, Tristan Bret
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Abstract
The present application relates to a method for disposing of excess material of a photolithographic mask, wherein the method comprises the following steps: (a) enlarging a surface of the excess material; (b) displacing the enlarged excess material on the photolithographic mask using at least one first probe of a scanning probe microscope; and (c) removing the displaced enlarged excess material from the photolithographic mask.
Claims16
A method for depositing material on a sample, comprising:
- providing at least one deposition gas;
- providing at least one additive gas comprising ammonia;
- providing at least one particle beam incident on a surface of the sample;
- and
- depositing material onto a region of the sample based at least in part on the at least one deposition gas, the at least one additive gas, and the at least one particle beam.
2 more elements
Dependencies are inferred from the claim text.