Film deposition apparatus

A film deposition apparatus comprising:

• a processing container;
• a stage that is accommodated in the processing container, and on which a substrate is placed;
• a heat-insulating member that includes a plurality of penetration holes, and that is located on or above the stage to cover the substrate placed on the stage;
• a gas supply that supplies gas of a first monomer and gas of a second monomer into the processing container to form an organic film of a polymer on the substrate by a polymerization reaction between the first monomer and the second monomer;
• a first heater that heats a side wall of the processing container to a first temperature;
• and
• a second heater that heats the stage to a second temperature lower than the first temperature, wherein
• in a case where the organic film of the polymer is formed on the substrate, the heat-insulating member is in contact with the stage, and is not in contact with the processing container.