Modified cerium oxide polishing solution for shallow trench isolation and preparation method thereof

Abstract

Provided are a modified cerium oxide polishing solution for shallow trench isolation and a preparation method thereof. The modified cerium oxide polishing solution is mainly prepared from, in percentages by mass, the following raw materials: 2% to 5% of a modified cerium oxide abrasive; and 95% to 98% of deionized water, where the modified cerium oxide abrasive includes a cerium oxide abrasive and a sulfonic acid ligand; and the sulfonic acid ligand is at least one selected from the group consisting of L-camphorsulfonic acid, o-toluenesulfonic acid, p-toluenesulfonic acid, and cyclohexane-2-sulfonic acid.

Dependencies are inferred from the claim text.