Substrate processing apparatus

A substrate processing apparatus including a substrate processing chamber configured to process a substrate in a horizontal attitude, the substrate processing apparatus comprising

• a center robot configured to transfer the substrate to and from the substrate processing chamber,
• wherein
• the substrate processing chamber includes:
• a first processing unit configured to perform first processing on the substrate;
• a second processing unit provided adjacent to the first processing unit in a horizontal direction and configured to perform second processing different from the first processing on the substrate;
• a partition wall provided between the first processing unit and the second processing unit and including a passage port configured to allow the substrate to pass through;
• and
• an auxiliary robot configured to convey the substrate between the first processing unit and the second processing unit via the passage port,
• the auxiliary robot includes:
• a robot base provided adjacent to the partition wall;
• a substrate conveyance arm configured to be movably supported by the robot base;
• a hand configured to be supported by the substrate conveyance arm and hold the substrate;
• an arm turning mechanism configured to turn the substrate conveyance arm with reference to the robot base;
• an arm length adjustment mechanism configured to change a turning radius of the hand by changing an arm length of the substrate conveyance arm;
• and
• a control unit configured to control the arm turning mechanism and the arm length adjustment mechanism, and
• the auxiliary robot is provided at a position separated from a virtual straight line connecting the first processing unit and the second processing unit.