Cmos sensor and method for manufacturing a cmos sensor

A method of manufacturing a CMOS sensor comprising an active substrate and photodiodes, the method comprising:

• forming photodiodes at a side of a first main surface of the active substrate;
• electrically coupling a terminal of the photodiodes via the active substrate to a ground line that is electrically coupled to a ground terminal, wherein the ground line is arranged adjacent to a second main surface of the active substrate;
• and
• attaching the active substrate to a sensor substrate so that the second main surface is facing the sensor substrate and the first main surface is remote from the sensor substrate.

An imaging apparatus comprising a CMOS sensor comprising an active substrate and photodiodes,

• wherein the photodiodes are arranged on a side of a first main surface of the active substrate;
• and
• a terminal of the photodiodes is electrically coupled via the active substrate to a ground line that is electrically coupled to a ground terminal, and
• the ground line is arranged adjacent to a second main surface of the active substrate;
• further comprising a sensor substrate, wherein the active substrate is attached to the sensor substrate so that the second main surface is facing the sensor substrate and the first main surface is remote from the sensor substrate.