Sulfonate, oxime sulfonate, imide sulfonate, amide sulfonate, acid generator containing said compound, and photoresist containing said acid generator

A compound represented by formula (b-1) or (b-2):

• wherein R1 represents an optionally substituted hydrocarbon group or heterocyclic group;
• L represents a single bond or a linking group;
• R2 and R3 are the same as or different from each other and each represent an organic group;
• and R10 represents a fluorine atom, an aromatic hydrocarbon group, or an aromatic heterocyclic group, and n represents 0 or 1.

A compound represented by formula (c-1) or (c-2):

• wherein R1 represents an optionally substituted hydrocarbon group or heterocyclic group;
• L and L′ are the same as or different from each other and each represents a single bond or a linking group;
• R4 and R5 are the same as or different from each other and each represent an optionally substituted hydrocarbon group;
• R4 and R5 are optionally linked to each other to form a ring together with an adjacent carbon atom;
• and R10 represents a fluorine atom, an aromatic hydrocarbon group, or an aromatic heterocyclic group, and n represents 0 or 1.

A compound represented by formula (d-1) or (d-2):

• wherein R1 represents an optionally substituted hydrocarbon group or heterocyclic group;
• L represents a single bond or a linking group;
• R6 and R7 are the same as or different from each other and each represent an optionally substituted hydrocarbon group;
• and R10 represents a fluorine atom, an aromatic hydrocarbon group, or an aromatic heterocyclic group, and n represents 0 or 1.