Bright field-dark field metrology apparatus

An improved, bright field-dark field metrology apparatus providing a faster, more precise semiconductor/Si wafer surface examination comprising:

• a white light source providing a collimated, circular, white light;
• a cylindrical lens;
• a rotatable modulator wheel;
• a relay/imaging lens placed between said modulator wheel and said semiconductor/Si wafer;
• a dark field line sensor camera;
• a dark field converging magnifying image lens placed in a path of refracted light from said target region, located between said target region and said dark field line sensor to provide a dark field refracted light to said dark field line sensor camera with a factor of dark field magnification;
• a bright field line sensor camera;
• a bright field converging magnifying image lens placed in a path of reflected light from said target region, located at a position between said target region and said bright field line sensor camera to provide a bright field reflected light to said bright field line sensor camera with a factor of bright field magnification;
• wherein said collimated, structured white light passes through said cylindrical lens and exits as an elliptically configured light that is focused in one axis and collimated in the other axis, and then passes through said modulator wheel to provide a structured, one axis collimated, one axis divergent elliptical light to said relay/imaging lens which focuses said structured, collimated elliptical light onto said target region which is reflected or refracted.