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US 2026/0287448 A1Published application
Matrix array force sensor
AssigneePeratech IP Ltd
InventorsTom MITCHELL-WILLIAMS, Daniel WHITING, Benjamin BEDDARD, Matthew GOSPEL
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Abstract
Examples disclosed relate to a matrix array force sensor having first and second stacked and at least one functional resistive layer located between the first layer and the second layer. The first layer has interdigitated row electrodes. The second layer has interdigitated column electrodes. A location of the force applied to the matrix array force sensor may be determined by the first and second stacked layers and the functional resistive layer.
Claims17
A matrix-array force sensor, comprising:
- a first layer comprising:
- a plurality of row electrodes each having a longitudinal axis orientated in a first direction, each of the plurality of row electrodes comprising a main body portion and at least one interpolation portion, wherein each interpolation portion comprises a plurality of projections which are interdigitated with the plurality of projections of the interpolation portion of an adjacent row electrode to together form a interpolation region, the first layer thereby comprising a row interpolation region;
- wherein a location of a force applied in the row interpolation region is determinable in dependence on a first portion of the force detected by the projections of a first of the plurality of row electrodes and a second portion of the force detected by the projections of a second of the plurality of row electrodes adjacent the first of the plurality of row electrodes;
- a second layer, the first layer and second layer being stacked together, the second layer comprising:
- a plurality of column electrodes each having a longitudinal axis, orientated in a second direction perpendicular to the first direction, each of the plurality of column electrodes comprising a main body portion and at least one interpolation portion, wherein each interpolation portion comprises a plurality of projections which are interdigitated with the plurality of projections of the interpolation portion of an adjacent column electrode to together form a interpolation region, the second layer thereby comprising column interpolation region;
- wherein a location of the force applied in the column interpolation region, stacked with the row interpolation region, is determinable in dependence on a third portion of the force detected by the projections of a first of the plurality of column electrodes and a fourth portion of the force detected by the projections of a second of the plurality of column electrodes adjacent the first of the plurality of column electrodes;
- at least one functional resistive layer located between the first layer and the second layer;
- where the location of the force applied to the matrix-array force sensor is determinable in dependence on the detected first, second, third and fourth portions of the force.
5 more elements
A method of manufacturing a matrix-array force sensor, the method comprising:
- forming a first layer, by:
- forming a plurality of row electrodes each having a longitudinal axis orientated in a first direction, each of the plurality of row electrodes comprising a main body portion and at least one interpolation portion, wherein each interpolation portion comprises a plurality of projections which are interdigitated with the plurality of projections of the interpolation portion of an adjacent row electrode to together form a interpolation region, the first layer thereby comprising at least one row interpolation region;
- forming a second layer, by:
- forming a plurality of column electrodes each having a longitudinal axis, orientated in a second direction perpendicular to the first direction, each of the plurality of column electrodes comprising a main body portion and at least one interpolation portion, wherein each interpolation portion comprises a plurality of projections which are interdigitated with the plurality of projections of the interpolation portion of an adjacent column electrode to together form a interpolation region, the second layer thereby comprising at least one column interpolation region;
- and
- forming at least one functional resistive layer;
- locating the at least one functional resistive layer between the first layer and the second layer to form a stack.
4 more elements
Dependencies are inferred from the claim text.