Processing table, processing assembly and method for processing elastomeric material

The processing table for processing elastomeric material, the processing table comprising:

• a table body with a support surface for supporting the elastomeric material in a support plane, wherein the support surface extends in a first direction from a first side of the processing table to a second side of the processing table opposite to the first side over a table width;
• and
• a plurality of suction apertures that are distributed over the table body according to an aperture pattern,
• wherein the suction apertures are open at the support surface towards the support plane,
• wherein the aperture pattern defines a first retaining area and a second retaining area of the support surface,
• wherein the first retaining area and the second retaining area each extend from the first side to the second side of the processing table,
• wherein the first retaining area and the second retaining area are spaced apart in a second direction perpendicular to the first direction,
• wherein the aperture pattern further defines a processing area of the support surface between the suction apertures,
• wherein the processing area extends from the first side to the second side of the processing table and between the first retaining area and the second retaining area in the second direction,
• wherein the aperture pattern comprises a first pattern of suction apertures within the first retaining area and a second pattern of suction apertures within the second retaining area,
• wherein the first pattern extends between the first side and the second side along a part of a first pattern line that extends from the first side to the second side to define a part of a boundary between the first retaining area and the processing area, and
• wherein the second pattern extends between the first side and the second side along at least a part of a second pattern line that extends from the first side to the second side to define at least a part of a boundary between the second retaining area and the processing area,
• wherein the first pattern extends from the first side towards the second side over twenty to eighty percent of the table width,
• wherein the second pattern extends from the second side towards the first side over twenty to eighty percent of the table width.