Substrate processing
AssigneeASML Netherlands B.V.
InventorsPaulus Albertus VAN HAL, Adrianus Hendrik KOEVOETS
Life of this patent
Estimating the term…
Abstract
A method for processing a substrate, the method including: providing a substrate on a support; measuring a property of the substrate and/or of a rinsing liquid; controlling the addition of one or more additives to the rinsing liquid based on the measurement, to adjust the pH value and/or the conductivity of the rinsing liquid to a predetermined value; and providing the rinsing liquid to a surface of the substrate via one or more nozzles. There is also provided a system for processing a substrate, and a method for manufacturing a device.
Claims21
A method for comprising:
- measuring a property of a substrate and/or of a rinsing liquid, the measuring the property of the substrate comprising obtaining a charge-measurement based spatial profile of the substrate;
- controlling the addition of one or more additives to the rinsing liquid based on the measurement, to adjust the pH value and/or the conductivity of the rinsing liquid to a predetermined value;
- and
- providing the rinsing liquid to a first surface of the substrate via one or more nozzles.
(canceled)
A system for processing a substrate, the system comprising:
- a support to support the substrate;
- one or more nozzles arranged to provide a rinsing liquid to a surface of the substrate;
- a measurement system configured to measure a property of the substrate and of the rinsing liquid, wherein the measurement system is configured to provide a charge-measurement based spatial profile of the substrate;
- and
- a controller configured to adjust the pH value and/or the conductivity of the rinsing liquid based on the measurement of the measurement system, by controlling the addition of one or more additives to the rinsing liquid.
Dependencies are inferred from the claim text.