Method of storing photoresist coated substrates and semiconductor substrate container arrangement

A storage system, comprising:

• a front opening unified pod, wherein the front opening unified pod includes an upper space for storing a plurality of semiconductor substrates and a lower space connected to the upper space, and a width of the lower space is greater than a width of the upper space, wherein the front opening unified pod is configured so that all the semiconductor substrates are stored above the lower space;
• a platform supporting the front opening unified pod;
• an inert gas source or extreme clean dry air source coupled to the front opening unified pod via a gas inlet;
• a gas outlet coupled to the front opening unified pod, wherein the gas inlet and the gas outlet pass through an upper surface of the platform and a bottom wall of the lower space;
• and
• a controller configured to monitor a relative humidity of a gas exiting the front opening unified pod and control the relative humidity of the gas exiting the front opening unified pod to below a threshold relative humidity, wherein the threshold relative humidity is between 0.1% relative humidity and 1% relative humidity.

A storage system, comprising:

• a front opening unified pod, wherein the front opening unified pod includes an upper space for storing a plurality of semiconductor substrates and a lower space connected to the upper space, and a width of the lower space is greater than a width of the upper space, wherein the front opening unified pod is configured so that all the semiconductor substrates are stored above the lower space;
• a platform supporting the front opening unified pod;
• a gas inlet coupled to the front opening unified pod;
• a gas purifier coupled to the gas inlet;
• an inert gas source or extreme clean dry air source coupled to the front opening unified pod via the gas purifier and the gas inlet;
• a gas outlet coupled to the front opening unified pod, wherein the gas inlet and the gas outlet pass through an upper surface of the platform and a bottom wall of the lower space;
• and
• a controller configured to monitor a relative humidity of a gas exiting the gas outlet and configured to control the inert gas source or extreme dry air source, the gas purifier, the gas inlet, and the gas outlet to maintain the relative humidity of the gas exiting the gas outlet to below a threshold relative humidity, wherein the threshold relative humidity is between 0.1% relative humidity and 1% relative humidity.