Photocurable composition for forming an imprint lithography template

A method of forming an imprint lithography template, comprising:

• applying a layer of a photocurable composition on a backing layer, wherein the photocurable composition comprises a polymerizable material and at least one photoinitiator, the polymerizable material comprises
• at least one first monomer and at least one second monomer, the at least one first monomer being a silicon-containing monomer and the at least one second monomer being essentially free of silicon,
• the at least on first monomer has a structure of formula (1):
• wherein:
• R1, R2, R3, and R4 are independently selected from —O—Si(CH3)3, alkyl, aryl, or alkylaryl;
• L is C1-C5-alkyl, or aryl, or alkylaryl;
• R5 is -L-Y, or Y, or —O—Si(CH3)3, or alkyl, or aryl, or
• alkylaryl;
• Y is acrylate, or methacrylate, or vinyl;
• n:
• 0-4;
• an amount of silicon is at least 5 wt % and not greater than 14 wt % based on the total weight of the polymerizable material, and
• the at least one second monomer comprises at least one multi-functional monomer, wherein in an amount of at least one multi-functional monomer of the second monomer is at least 30 wt % based on the total weight of the polymerizable material;
• bringing the photocurable composition into contact with a template;
• irradiating the photocurable composition with light to form a photo-cured patterned layer;
• and
• removing the template from the patterned layer.