US 2026/0271611 A1 · POLYAMIC ACID WITH SACRIFICIAL CARBOXYLIC ACID GROUPS AS PASSIVATORS FOR PEROVSKITES

Abstract

The present invention relates to a polyamic acid material containing sacrificial carboxylic acid groups, designed as a passivator to enhance the performance and stability of perovskite solar cells (PSCs). This material facilitates improved perovskite crystallization and passivator dispersion via weak interactions. During thermal treatment, the sacrificial carboxylic acid groups are eliminated, forming a hydrophobic polyimide protective layer that significantly improves water and chemical resistance. The polyamic acid-based approach addresses the challenges of degradation under heat and humidity, achieving a power conversion efficiency exceeding 23% while extending device lifespan. This innovation overcomes limitations in prior methods by integrating stability enhancement with high efficiency, marking a significant advancement in PSC technology and promoting their commercial viability.

Claims18

Dependent claims

A polyamic acid-based passivator, wherein the polyamic acid-based passivator comprises a polyamic acid material with the following formula:

A is selected from
and m is in a range of 1 to 100,
B is selected from
and
wherein the polyamic acid material undergoes thermal treatment to form a polyimide protective layer that enhances the stability of the perovskite.

2 more elements

A perovskite solar cell, comprising, from top to bottom:

a metal electrode layer;
a hole transport layer;
a perovskite layer comprising a perovskite precursor composition and at least one polyamic acid-based passivator, wherein the polyamic acid-based passivator contains sacrificial carboxylic acid groups and is incorporated into the perovskite precursor composition, and the perovskite precursor composition is coated onto a substrate, or optionally the polyamic acid-based passivator is deposited on one or both sides of a pristine perovskite layer;
an electron transport layer;
and
a transparent conductive layer,
wherein the at least one polyamic acid-based passivator is deposited on one side or both sides of the perovskite, and the polyamic acid material interacts with the perovskite components between the sacrificial carboxylic acid groups and the perovskite, and
wherein the polyamic acid material undergoes thermal treatment to form a polyimide protective layer on the perovskite layer.

5 more elements

Dependencies are inferred from the claim text.

Facts

Application

19/069,253Filed 4 Mar 2025

Published

10 Sep 2026

Term ends

Not estimatedThe source records don’t support an estimate.

Classification14 codes

H10K 85/111
Organic polymers or oligomers: comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
C08G 73/1082
Partially aromatic polyimides: wholly aromatic in the tetracarboxylic moiety
H10K 30/30
Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation: comprising bulk…
H10K 30/40
Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation: comprising a…

Polyamic acid with sacrificial carboxylic acid groups as passivators for perovskites

Life of this patent

Polyamic acid with sacrificial carboxylic acid groups as passivators for perovskites

Life of this patent

Abstract

Claims18