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US 2026/0265922 A1Published application
Compositions for uniform etching of high aspect ratio structures
AssigneeEntegris, Inc.
InventorsChia-Jung Hsu, Chiao-Yin Hsieh, Ming-Chi Liao, Wei-Ling Lan
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Abstract
Compositions are provided. A composition comprises a phosphoric acid component. A composition comprises an acetic acid component. A composition comprises a nitric acid component. A composition comprises a solvent. The solvent is present in an amount sufficient for the composition to have a viscosity of 5 cP to 100 cP as measured according to ASTM D445. Related methods are provided, among other things.
Claims20
A composition comprising:
- a phosphoric acid component;
- an acetic acid component;
- a nitric acid component;
- and
- a solvent,
- wherein the solvent is present in an amount sufficient for the composition to have a viscosity of 5 cP to 100 cP as measured according to ASTM D445.
3 more elements
A method comprising:
- obtaining a structure defining a plurality of recesses,
- wherein the structure comprises a molybdenum material located in the plurality of recesses;
- obtaining a composition,
- wherein the composition comprises:
- a phosphoric acid component;
- an acetic acid component;
- a nitric acid component;
- and
- a solvent,
- wherein the solvent is present in an amount sufficient for the composition to have a viscosity of 5 cP to 100 cP as measured according to ASTM D445;
- and
- contacting the structure with the composition to remove at least a portion of the molybdenum material.
9 more elements
Dependencies are inferred from the claim text.