Substrate cleaning device, substrate cleaning method, and semiconductor device manufacturing method

A substrate cleaning device comprising:

• an ozone water generation unit configured to receive, in a gas-liquid mixer, ozone gas and a solvent that can dissolve the ozone gas, and generate ozone water;
• an ozone water supply unit configured to discharge the ozone water;
• a miscible liquid supply unit configured to discharge a miscible liquid that is miscible with the ozone water;
• and
• a support portion structured to support a substrate so that the substrate is located in a direction of discharge of the ozone water by the ozone water supply unit,
• wherein the gas-liquid mixer includes:
• a solvent flow passage through which the solvent flows;
• and
• an ozone gas introduction passage which is connected to the solvent flow passage and which introduces the ozone gas into the solvent flow passage, and the gas-liquid mixer receives the ozone gas at an ozone concentration of 50 vol % or more and at an ozone partial pressure of 30 kPa (abs) or less,
• wherein in a state in which the substrate is located in the direction of the discharge of the ozone water by the ozone water supply unit, the miscible liquid supply unit is configured to be able to discharge the miscible liquid to a discharge-receiving side part, which is a side where the ozone water is discharged, of the substrate at a temperature that is higher than that of the ozone water discharged by the ozone water supply unit, and
• wherein the ozone water supply unit and the miscible liquid supply unit are configured to discharge the ozone water and the miscible liquid simultaneously or alternately to mix both of the ozone water and the miscible liquid at the discharge-receiving side part.

A substrate cleaning method comprising:

• an ozone water generation step of receiving, in a gas-liquid mixer, ozone gas and a solvent that can dissolve the ozone gas, and generating ozone water;
• an ozone water supply step of discharging the ozone water to a substrate that is supported by a support portion;
• and
• a miscible liquid supply step of discharging a miscible liquid that is miscible with the ozone water, to the substrate,
• wherein the gas-liquid mixer includes:
• a solvent flow passage through which the solvent flows;
• and
• an ozone gas introduction passage which is connected to the solvent flow passage and which introduces the ozone gas into the solvent flow passage, and
• the gas-liquid mixer receives the ozone gas at an ozone concentration of 50 vol % or more and at an ozone partial pressure of 30 kPa (abs) or less,
• wherein in the miscible liquid supply step, in a state in which the substrate is located in a direction of discharge of the ozone water by the ozone water supply step, the miscible liquid is discharged to a discharge-receiving side part, which is a side where the ozone water is discharged, of the substrate at a temperature that is higher than that of the ozone water discharged by the ozone water supply step, and
• wherein the ozone water supply step and the miscible liquid supply step are performed simultaneously or alternately, and both of the ozone water and the miscible liquid are mixed at the discharge-receiving side part.