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AssigneeHitachi High-Tech Corporation
InventorsNatsuki TSUNO, Yasuhiro SHIRASAKI, Minami SHOUJI, Daisuke BIZEN, Makoto SUZUKI, Satoshi TAKADA, Yohei NAKAMURA
Estimating the term…
An inspection system includes: an electron source which irradiates a sample with an inspection beam, a detector which detects secondary electrons and outputs a detection signal, a laser device which emits an action laser, an electron gun which emits an action electron beam, and a computer system which generates an image of the sample based on the detection signal. The computer system generates an inspection image based on the inspection beam, acquires the dimensions and the like related to a pattern on the sample based on the inspection image, generates an inspection image related to the emission of the action laser and the inspection beam, acquires the material characteristics related to the pattern based on the inspection image, generates an inspection image related to the emission of the action electron beam and the inspection beam, and acquires the electrical characteristics related to the pattern based on the inspection image.
An inspection system that irradiates a sample with an inspection beam which is a charged particle beam, the inspection system comprising:
An inspection method for irradiating a pattern on a sample with an inspection beam that is a charged particle beam to detect secondary charged particles, and acquiring feature values of the pattern based on detection signals, the inspection method comprising:
A non-transitory computer-readable medium comprising a plurality of instructions that, when executed by a processor, cause the processor to perform:
Dependencies are inferred from the claim text.