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US 2026/0258546 A1Published application
Precursors and methods for depositing metal-containing films
AssigneeEntegris, Inc.
InventorsClaudia Fafard, Thomas M. Cameron, Bryan C. Hendrix
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Abstract
Precursors and methods for depositing metal-containing films are provided herein. The method includes obtaining a substrate comprising a plurality of halides. The method includes obtaining a reducing agent. The method includes contacting the substrate with the reducing agent to remove at least a portion of the plurality of halides. Related compositions and articles are also provided.
Claims20
A method comprising:
- obtaining a substrate comprising a plurality of halides;
- obtaining a reducing agent comprising a compound of the formula:
- wherein R1 and R2 independently comprise at least one of an alkyl, an aryl, a cycloalkyl, a heterocycloalkyl, a heteroaryl, an amine, or any combination thereof;
- or
- R1 and R2 are bonded to form a cyclic ring;
- and
- contacting the substrate with the reducing agent to at least remove at least a portion of the plurality of halides.
4 more elements
A method comprising:
- obtaining a substrate comprising a plurality of silylenes;
- obtaining a metal halide;
- and
- contacting the substrate with the metal halide to form a film on the substrate.
1 more element
A kit comprising:
- a first container comprising a vaporizable precursor,
- wherein the vaporizable precursor comprises a metal halide;
- and
- a second container comprising a reducing agent,
- wherein the reducing agent comprises a compound of the formula:
- wherein R1 and R2 independently comprise at least one of an alkyl, an aryl, a cycloalkyl, a heterocycloalkyl, a heteroaryl, an amine, or any combination thereof;
- or
- R1 and R2 are bonded to form a cyclic ring,
- wherein, when the vaporizable precursor and the reducing agent are vaporized and contacted with a substrate comprising at least one of a plurality of halides, a plurality of silylenes, or any combination thereof, the vaporizable precursor and the reducing agent react to form a film on the substrate.
6 more elements
A composition comprising:
- a reducing agent for film deposition,
- wherein the reducing agent comprises a compound of the formula:
- wherein R1 and R2 independently comprise at least one of an alkyl,
- an aryl, a cycloalkyl, a heterocycloalkyl, a heteroaryl, an amine, or any combination thereof;
- or
- R1 and R2 are bonded to form a cyclic ring.
3 more elements
Dependencies are inferred from the claim text.