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US 2026/0258280 A1Published application
Silicon-containing film forming composition and method for manufacturing silicon-containing film using the same
AssigneeMerck Patent GmbH
InventorsNAOKO NAKAMOTO, HIDEYUKI TAKAGISHI, TAKASHI FUJIWARA, ATSUHIKO SATO
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Abstract
A silicon-containing film forming composition comprising (I) a polymer having a polysilane skeleton comprising a particular repeating unit, (II) a silicon compound having an unsaturated hydrocarbon bond, and (III) a solvent.
Claims19
A silicon-containing film forming composition comprising:
- (I) a polymer having a polysilane skeleton comprising a repeating unit represented by the formula (ia):
- wherein
- Ra1 and Ra2 are each independently a single bond, hydrogen, halogen, C1-6 alkyl, C6-10 aryl or —SiRA3 wherein each RA is independently hydrogen or C1-8 alkyl, and
- p is an integer of 5 or more;
- (II) a silicon compound having an unsaturated hydrocarbon bond;
- and
- (III) a solvent.
4 more elements
Dependencies are inferred from the claim text.