US 2026/0250561 A1 · COMPOUND

Abstract

The present application provides a compound, a release composition, a release layer, a release film, and a pressure-sensitive adhesive film. The present application can provide a compound that can form a release layer which enables to exhibit an appropriate level of release peel force, and has an excellent bonding force with a base film and excellent solvent resistance. In addition, the present application can provide a compound that when the release layer has been formed, the release layer exhibits a stable residual adhesion rate even in the case of being repeatedly applied to a pressure-sensitive adhesive layer, and the like. The present application also provides a release composition and a release layer comprising the compound, and a release film and a pressure-sensitive adhesive film comprising the release layer.

Claims19

Dependent claims

A compound expressed in an average unit of Formula 1 below:

wherein, R1 is a radical generating functional group, R2 is hydrogen, an isocyanatoalkyl group, a hydroxyalkyloxy group, an alkoxy group, or a monovalent hydrocarbon group, X is a linker linking silicon atoms of the compound to each other, which is an oxygen atom or a divalent linker of Formula 2 below, m is a number in a range of 1 to 3, n is a number in a range of 0 to 2, and m+n is a number in a range of 1 to 3:
wherein, L1 is an alkylene group or an alkylidene group, and the oxygen atoms on both sides of L1 are directly linked to the silicon atoms of the compound, respectively.

Dependencies are inferred from the claim text.

Compound

Life of this patent

Compound

Life of this patent

Abstract

Claims19