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US 2026/0250125 A1Published application
Hierarchical silicon nanostructures, methods of making, and methods of use
OwnerPeng Jiang, Zhuxiao Gu +1inventors
InventorsPeng Jiang, Zhuxiao Gu, Calen Leverant
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Abstract
Described herein are antireflective materials and methods of making antireflective materials. The material can include a plurality of hierarchical nanostructures on a base substrate and a total specular reflection of less than 3% at a wavelength of about 400nm to about 1100 nm. The material can have an etched polyimide layer disposed on the superior surface of the hierarchical nanostructures. The materials can also have superhydrophobic characteristics.
Claims16
A material comprising:
- a plurality of hierarchical nanostructures on a base substrate, wherein the hierarchical nanostructures comprise concave nanoposts filled with a plurality of nanocones, wherein the base substrate and the plurality of hierarchical nanostructures are made of silicon or black silicon.
A method of making an antireflective material, comprising:
- disposing a mask comprising an array of templating nanoparticles on a top surface of a base substrate by removing the base substrate from a solution having colloidal silica nanoparticles disposed on the surface of the solution, wherein as the base substrate is withdrawn from the solution the array of templating nanoparticles is disposed on the top surface of the base substrate;
- etching the top surface of the base substrate;
- removing the templating nanoparticles, where the removal of the templating nanoparticles forms concave nanoposts;
- disposing a polyimide layer on the concave nanoposts;
- and etching the polyimide layer to form hierarchical nanocylinders, the nanocylinders comprising nanocones in concave nanoposts, wherein the base substrate and hierarchical nanocylinders are made of silicon or black silicon.
2 more elements
Dependencies are inferred from the claim text.