Polishing composition, concentrated liquid of polishing composition, and polishing method

Abstract

The present invention provides a polishing composition capable of improving the surface quality of an object to be polished after polishing. The present disclosure relates to the polishing composition comprising (A) an abrasive, (B) Compound α having a polyethylene oxide structure and a polypropylene oxide structure, (C) a water soluble polymer different from the Compound α, (D) a basic compound, and (E) a dispersion medium, wherein (B) the Compound α is contained in an amount of 0.0001 mass % or more relative to the total mass of the polishing composition, and the ratio of the total mass of (B) the Compound α and (C) the water soluble polymer to the mass of (A) the abrasive, [{(B)+(C)}/(A)], is 0.058 or more and less than 0.150.

Dependencies are inferred from the claim text.