US 2026/0231733 A1 · METHOD FOR DETECTING ABNORMALITY IN PROCESS, PROGRAM STORED IN RECORDING MEDIUM, AND SUBSTRATE PROCESSING APPARATUS

Abstract

An exemplary embodiment of the present invention provides a method of detecting a process abnormality, the method including: deriving reference data from a plurality of sample data, and comparing the derived reference data with determination target data to detect an abnormality in a process performed while the determination target data is collected, in which the sample data and the determination target data are data collected while a process of processing a substrate is performed, the reference data includes: a first reference band, which is a threshold range at a first data point; and a second reference band, which is a threshold range at a second data point, in which the second data point is a point having a measurement value acquisition time point different from the first data point, and the first reference band and the second reference band have different sizes.

Claims13

Dependent claims

A method of detecting a process abnormality, the method comprising:

deriving reference data from a plurality of sample data, and comparing the derived reference data with determination target data to detect an abnormality in a process performed while the determination target data is collected,
wherein the sample data and the determination target data are data collected while a process of processing a substrate is performed,
the reference data includes:
a first reference band, which is a threshold range at a first data point;
and
a second reference band, which is a threshold range at a second data point, in which the second data point is a point having a measurement value acquisition time point different from the first data point, and
the first reference band and the second reference band have different sizes.

4 more elements

An apparatus for processing a substrate, the apparatus comprising:

a process chamber for performing a process of processing the substrate;
at least one sensor for collecting a measurement value for a process factor related to the process;
and
a controller for receiving the measurement value measured by the sensor,
wherein the controller controls the process chamber to perform the process of processing the substrate multiple times to collect a plurality of sample data from the sensor, and
derives reference data from the plurality of sample data and stores the derived reference data in a recording medium of the controller,
the reference data includes:
a first reference band, which is a threshold range at a first data point;
and
a second reference band, which is a threshold range at a second data point, in which the second data point is a point having a measurement value acquisition time point different from the first data point, and
the first reference band and the second reference band have different sizes.

8 more elements

Dependencies are inferred from the claim text.

Method for detecting abnormality in process, program stored in recording medium, and substrate processing apparatus

Life of this patent

Method for detecting abnormality in process, program stored in recording medium, and substrate processing apparatus

Life of this patent

Abstract

Claims13